The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Jan. 17, 2012
Isao Gunji, Nirasaki, JP;
Yusaku Izawa, Nirasaki, JP;
Hitoshi Itoh, Nirasaki, JP;
Tomonori Umezaki, Ube, JP;
Yuta Takeda, Ube, JP;
Isamu Mori, Chiyoda-ku, JP;
Isao Gunji, Nirasaki, JP;
Yusaku Izawa, Nirasaki, JP;
Hitoshi Itoh, Nirasaki, JP;
Tomonori Umezaki, Ube, JP;
Yuta Takeda, Ube, JP;
Isamu Mori, Chiyoda-ku, JP;
Tokyo Electron Limited, Tokyo, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with β-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and β-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to β-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.