Isamu Mori

Title: Isamu Mori: Innovator in Dry Etching Technology

Introduction

Isamu Mori is a prominent inventor based in Ube, Japan, known for his significant contributions to the field of dry etching technology. With a total of 14 patents to his name, Mori has made remarkable advancements that enhance the efficiency and effectiveness of etching processes in various applications.

Latest Patents

Mori's latest patents include a dry etching agent composition and a silicon dry etching method. The dry etching agent composition features 1,3,3,3-tetrafluoropropene and a hydrochlorofluorocarbon, designed to suppress corrosion in storage containers and etching chambers. This invention aims to improve the storage stability of HFO-1234 while maintaining excellent etching characteristics. The silicon dry etching method involves supplying an iodine heptafluoride-containing etching gas under specific pressure conditions, allowing for efficient etching of silicon layers without increasing equipment costs.

Career Highlights

Throughout his career, Isamu Mori has worked with notable companies such as Central Glass Company, Limited and Combi Corporation. His experience in these organizations has contributed to his expertise in developing innovative etching solutions.

Collaborations

Mori has collaborated with esteemed colleagues, including Akiou Kikuchi and Tomonori Umezaki, further enhancing his work in the field of dry etching technology.

Conclusion

Isamu Mori's contributions to dry etching technology have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing etching processes, making a lasting impact on the field.