The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
May. 07, 2014
Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;
Yasuo Hibino, Shiki, JP;
Tomonori Umezaki, Ube, JP;
Akiou Kikuchi, Ube, JP;
Isamu Mori, Tokyo, JP;
Satoru Okamoto, Fujimino, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
A dry etching agent according to the present invention contains (A) a fluorinated propyne represented by the chemical formula: CFC≡CX where X is H, F, Cl, Br, I, CH, CFHor CFH; and either of: (B) at least one kind of gas selected from the group consisting of O, O, CO, CO, COCland COF; (C) at least one kind of gas selected from the group consisting of F, NF, Cl, Br, Iand YFn where Y is Cl, Br or I; and n is an integer of 1 to 5; and (D) at least one kind of gas selected from the group consisting of CF, CHF, CF, CFH, CFH, CF, CFH, CClFH and CF. This dry etching agent has a small environmental load and a wide process window and can be applied for high-aspect-ratio processing without special operations such as substrate excitation.