The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Jun. 24, 2011
Applicants:
Kenji Matsumoto, Yamanashi, JP;
Shigetoshi Hosaka, Yamanashi, JP;
Hitoshi Itoh, Yamanashi, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 5/12 (2006.01); C23C 16/40 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
B05D 5/12 (2013.01); C23C 16/40 (2013.01); H01L 21/76831 (2013.01); H01L 21/76846 (2013.01); H01L 21/76856 (2013.01); H01L 21/76861 (2013.01); H01L 21/76867 (2013.01); H01L 21/76873 (2013.01); H01L 23/5329 (2013.01); H01L 23/53238 (2013.01); H01L 2924/0002 (2013.01); H01L 2924/09701 (2013.01);
Abstract
A film forming method performs a film forming process on a target object having on a surface thereof an insulating layer. The film forming method includes a first thin film forming step of forming a first thin film containing a first metal, an oxidation step of forming an oxide film by oxidizing the first thin film, and a second thin film forming step of forming a second thin film containing a second metal on the oxide film.