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For the Inventor, By the Inventor

Iwate, Japan

Hiroyuki Kikuchi

This inventor holds 33 USPTO granted patents and 13 published patent applications, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Adv Antest Corporation, Isao Corporation. Active years: 2001-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Kikuchi. Retrieved from https://idiyas.com/inventor/hiroyuki-kikuchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 90.9

Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 147(Granted Patents)


Location History:

  • Esashi, JP (2001)
  • Gunma, JP (2016 - 2017)
  • Oshu, JP (2014 - 2022)
  • Tokyo, JP (2006 - 2023)
  • Iwate, JP (2014 - 2024)
  • Yamanashi, JP (2024)

Company Filing History:

goldMedal25 out of 10,918 
 
Tokyo Electron Limited
 patents
silverMedal6 out of 2,282 
 
Adv Antest Corporation
 patents
bronzeMedal2 out of 3 
 
Isao Corporation
 patents

Years Active: 2001-2025

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Areas of Expertise:
Plasma Processing
Film Deposition
Electronic Component Handling
Substrate Processing
Authentication Systems
CVD Methods
Heat-Treating
Electronic Device Testing
Activated Gas Injector
Film Forming
Gap Fill Processes
Image Sensor Testing
33 patents (USPTO):Explore Patents
1. 12374526 - Plasma processing apparatus and plasma processing method (2025-07-29),
2. 12368030 - Deposition method and deposition apparatus (2025-07-22),
3. 12051566 - Plasma processing apparatus (2024-07-30),
4. 11901158 - Plasma processing method, plasma processing apparatus, and control apparatus (2024-02-13),
5. 11714124 - Electronic component handling apparatus and electronic component testing apparatus (2023-08-01),
6. 11579189 - Electronic component handling apparatus and electronic component testing apparatus (2023-02-14),
7. 11495457 - Film forming method (2022-11-08),
8. 11085113 - Film forming method and recording medium (2021-08-10),
9. 10683573 - Film forming apparatus (2020-06-16),
10. 10659461 - System, method, and recording medium storing program for authentication (2020-05-19),
11. 10594485 - System, method, program, and recording medium storing program for authentication (2020-03-17),
12. 10072336 - Film forming apparatus, film forming method, and recording medium (2018-09-11),
13. 9932674 - Film deposition apparatus, film deposition method, and computer-readable recording medium (2018-04-03),
14. 9865499 - Method and apparatus for gap fill using deposition and etch processes (2018-01-09),
15. 9865454 - Substrate processing apparatus and substrate processing method (2018-01-09),

Title: The Innovative Journey of Hiroyuki Kikuchi

Introduction: Hiroyuki Kikuchi, a talented inventor hailing from Iwate, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Hiroyuki Kikuchi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise and creativity.

Career Highlights: With a career spanning over two decades, Hiroyuki Kikuchi has worked with leading research institutions and tech companies, spearheading projects that have revolutionized various industries. His commitment to pushing the boundaries of innovation has earned him recognition as a visionary in the field.

Collaborations: Throughout his career, Hiroyuki Kikuchi has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence. His ability to work effectively in multidisciplinary teams has led to the successful development of cutting-edge technologies.

Conclusion: Hiroyuki Kikuchi's passion for innovation, coupled with his relentless drive to create solutions for the future, continues to inspire the next generation of inventors and entrepreneurs. His remarkable journey serves as a testament to the power of creativity and perseverance in shaping a better tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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