The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Apr. 27, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Takeshi Kobayashi, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/509 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); C23C 16/45544 (2013.01); C23C 16/4584 (2013.01); C23C 16/509 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01L 21/68764 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/332 (2013.01);
Abstract
A plasma processing apparatus includes a vacuum container and a plasma source that generates plasma in the vacuum container. The plasma source includes an antenna, an RF power supply connected to one end of the antenna and configured to supply an RF power to the antenna, and a variable capacitor connected to the other end of the antenna and having a variable capacitance.