The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
May. 09, 2012
Hitoshi Kato, Iwate, JP;
Katsuyuki Hishiya, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Shigehiro Ushikubo, Iwate, JP;
Shigenori Ozaki, Yamanashi, JP;
Hitoshi Kato, Iwate, JP;
Katsuyuki Hishiya, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Shigehiro Ushikubo, Iwate, JP;
Shigenori Ozaki, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film deposition apparatus includes a vacuum chamber into which first and second gases are sequentially supplied for a plural times, a rotation table including a first surface having a receiving area and rotating the receiving area inside the vacuum chamber, a first part supplying the first gas to a first region, a second part supplying the second gas to a second region separated from the first region in a peripheral direction of the rotation table via a separation region, a plasma gas part supplying a plasma generation gas into a plasma region inside the vacuum chamber, an antenna facing the first surface of the rotation table and generating plasma from the plasma generation gas inside a plasma space by inductive coupling, and a faraday shield being grounded and provided between the antenna and the plasma space and including slits aligned in a direction perpendicularly intersecting the antenna.