Matsudo, Japan

Hiroshi Shinriki



Average Co-Inventor Count = 2.8

ph-index = 19

Forward Citations = 2,018(Granted Patents)


Location History:

  • Kofu, JP (2000 - 2002)
  • Yamanashi, JP (2004)
  • Chiba, JP (1996 - 2006)
  • Nirasaki, JP (2004 - 2008)
  • Tokyo, JP (2008)
  • Matsudo, JP (1996 - 2011)
  • Tama, JP (2007 - 2012)

Company Filing History:


Years Active: 1996-2012

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42 patents (USPTO):

Title: Hiroshi Shinriki: Innovator in Metal Film Technology

Introduction

Hiroshi Shinriki, based in Matsudo, Japan, is a distinguished inventor known for his significant contributions to the field of metal film technology. With a remarkable portfolio of 42 patents, Shinriki has been at the forefront of innovation in atomic layer deposition techniques.

Latest Patents

Among his latest inventions, two notable patents stand out. The first is a "Method for forming metal film by ALD using beta-diketone metal complex," which outlines a procedure for creating a single-metal film on a substrate through plasma atomic layer deposition (ALD). This method involves contacting the surface of a substrate with a beta-diketone metal complex in a gas phase and subsequently exposing the surface to a nitrogen-hydrogen mixed plasma to accumulate atomic layers.

The second patent details an "Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition." This invention describes a metal film consisting of multiple atomic layers of ruthenium and tungsten or titanium, with a varying atomic composition throughout the thickness. Notably, the top section of the film has a specific atomic ratio, while the bottom section maintains a different range, allowing for precise control over the material properties.

Career Highlights

Throughout his career, Shinriki has made significant contributions while working with leading companies such as Tokyo Electron Limited and Kawasaki Steel Corporation. His work has positioned him as a key player in advancing metal film technologies that are critical in various applications, enhancing both performance and efficiency in the industry.

Collaborations

In his professional journey, Shinriki has collaborated with talented individuals like Shintaro Aoyama and Tomohiro Ohta. These partnerships have fostered innovative solutions and furthered advancements in atomic layer deposition methods.

Conclusion

Hiroshi Shinriki's inventive spirit and commitment to advancing metal film technology are evident in his extensive patent portfolio and collaborative efforts. His innovations not only improve existing processes but also pave the way for future advancements in the field, demonstrating the impact of dedicated inventors on technology and industry.

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