The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Aug. 29, 2008
Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition
Hiroshi Shinriki, Matsudo, JP;
Kunitoshi Namba, Machida, JP;
Daekyun Jeong, Tama, JP;
ASM Japan K.K., Tokyo, JP;
Abstract
A metal film composed of multiple atomic layers continuously formed by atomic layer deposition of Ru and Ta or Ti includes at least a top section and a bottom section, wherein an atomic composition of Ru, Ta or Ti, and N varies in a thickness direction of the metal film. The atomic composition of Ru, Ta or Ti, and N in the top section is represented as RuTa/Ti)Nwherein an atomic ratio of Ru/(Ta/Ti) is no less than 15, and z1 is 0.05 or less. The atomic composition of Ru, Ta or Ti, and N in the bottom section is represented as RuTa/TiNwherein an atomic ratio of Ru/(Ta/Ti) is more than zero but less than 15, and z2 is 0.10 or greater.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile