The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7383841 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 10, 2008

Filed:

Jul. 01, 2003
Applicants:

Hiroshi Shinriki, Nirasaki, JP;

Kazuya Dobashi, Nirasaki, JP;

Mikio Suzuki, Nirasaki, JP;

Takashi Magara, Nirasaki, JP;

Inventors:

Hiroshi Shinriki, Nirasaki, JP;

Kazuya Dobashi, Nirasaki, JP;

Mikio Suzuki, Nirasaki, JP;

Takashi Magara, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during substrate processing and set lower than the temperature of a substrate support member. After that, a cleaning gas containing hexafluoroacetylaceton (Hhfac) is supplied in the inner chamber, and substances to be cleaned off adhering inside the inner chamber are removed.


Find Patent Forward Citations

Shinriki, Hiroshi. (2008). Method of cleaning substrate-processing device and substrate-processing device (U.S. Patent No. 7383841). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7383841

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