Company Filing History:
Years Active: 2008-2025
Title: Mikio Suzuki: Innovator in Ruthenium Embedding Technologies
Introduction
Mikio Suzuki is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of surface processing and materials engineering. With a total of 6 patents to his name, Suzuki has developed innovative methods that enhance the functionality of substrates in various applications.
Latest Patents
One of his latest patents is titled "Method and apparatus for embedding ruthenium in recess formed on substrate surface." This invention outlines a method for embedding ruthenium in a recess on a substrate surface. The process involves forming a ruthenium layer in the recess by supplying a gas containing a ruthenium precursor that does not include oxygen and carbon atoms. Following this, ruthenium is embedded in the recess to cover the initial layer by using a gas that includes Ru(CO) as a precursor. Another notable patent is the "Surface processing method and processing system." This patent describes a method for surface processing a substrate with a metal layer in a recess formed in an insulating film. The method includes supplying a halogen-containing gas into a processing chamber and removing metal oxide from the recess's bottom using this gas.
Career Highlights
Mikio Suzuki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work focuses on advancing technologies that improve substrate processing and material applications. His innovative approaches have positioned him as a key figure in his field.
Collaborations
Throughout his career, Suzuki has collaborated with notable colleagues, including Toshio Hasegawa and Koji Maekawa. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in his area of expertise.
Conclusion
Mikio Suzuki's contributions to the field of materials engineering and surface processing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in the semiconductor industry. His work continues to influence the development of new methods and applications in substrate processing.