The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jul. 15, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/16 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/045 (2013.01); C23C 16/16 (2013.01); C23C 16/458 (2013.01); C23C 16/52 (2013.01);
Abstract
A method for embedding ruthenium in a recess formed on a surface of a substrate includes: forming a ruthenium layer in a region including a bottom portion of the recess by supplying a gas including, as a ruthenium precursor, a ruthenium compound that does not contain oxygen and carbon atoms to the substrate having a metal exposed on a bottom surface of the recess; and subsequently embedding ruthenium in the recess so as to cover the ruthenium layer by supplying a gas including, as a ruthenium precursor, Ru(CO)to the substrate.