Hirokazu Ueda

USPTO Granted Patents = 22 (Patent Applications = 14)

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 61(Granted Patents)

Location History:

Amagasaki, JP (2013)
Miyagi, JP (2015)
Sendai, JP (2013 - 2016)
Kofu, JP (2019)
Nirasaki, JP (2017 - 2023)
Yamanashi, JP (2016 - 2024)
Osaka, JP (2024)

Company Filing History:

22 out of 10,295

Tokyo Electron Limited

Fuji Electric Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2013-2025

where 'Filed Patents' based on already Granted Patents

22 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12486575 - Apparatus for processing substrate, gas shower head, and method for processing substrate (2025-12-02),

2. 12417928 - Substrate processing method and substrate processing system (2025-09-16),

3. 12406862 - Vacuum processing apparatus and oxidizing gas removal method (2025-09-02),

4. 12247768 - Electrocaloric effect element, heat transfer device, semiconductor manufacturing device, and electrocaloric effect element control method (2025-03-11),

5. 12112921 - Plasma processing method and plasma processing apparatus (2024-10-08),

6. 12077865 - Film forming method and film forming apparatus (2024-09-03),

7. 12060641 - Film forming method and film forming apparatus (2024-08-13),

8. 12011738 - Substrate processing method and ionic liquid (2024-06-18),

9. 11972929 - Processing apparatus and film forming method (2024-04-30),

10. 11842886 - Plasma processing method and plasma processing apparatus (2023-12-12),

11. 11615957 - Method for forming boron-based film, formation apparatus (2023-03-28),

12. 11145522 - Method of forming boron-based film, and film forming apparatus (2021-10-12),

13. 10388524 - Film forming method, boron film, and film forming apparatus (2019-08-20),

14. 10249498 - Method for using heated substrates for process chemistry control (2019-04-02),

15. 9658106 - Plasma processing apparatus and measurement method (2017-05-23),

Title: The Innovative Journey of Hirokazu Ueda

Introduction: Hirokazu Ueda, a pioneering inventor hailing from Nirasaki, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Hirokazu Ueda's latest patents focus on advancements in robotics and artificial intelligence, showcasing his commitment to pushing the boundaries of technological possibilities.

Career Highlights: With a career spanning over two decades, Hirokazu Ueda has established himself as a leading figure in the field of robotics. His work has been instrumental in shaping the future of automation and intelligent systems.

Collaborations: Throughout his career, Hirokazu Ueda has collaborated with top research institutions and tech companies to bring his inventions to life. His partnerships have led to the development of cutting-edge technologies that are revolutionizing industries worldwide.

Conclusion: Hirokazu Ueda's relentless pursuit of innovation and his passion for creating transformative technologies have solidified his reputation as a visionary inventor in the global tech community.

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14 patents pending:

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