The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Jan. 12, 2023
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Takeo Nakano, Nirasaki, JP;
Hirokazu Ueda, Osaka, JP;
Mitsuaki Iwashita, Nirasaki, JP;
Naoki Umeshita, Tokyo, JP;
Ryuichi Asako, Nirasaki, JP;
Kenichi Uki, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 7/24 (2006.01); B05D 1/02 (2006.01);
U.S. Cl.
CPC ...
B05D 7/24 (2013.01); B05D 1/025 (2013.01); B05D 2506/10 (2013.01);
Abstract
A substrate processing method includes forming a film of an ionic liquid on a surface of a substrate, on which a pattern is formed, by supplying the ionic liquid to the surface of the substrate, wherein the ionic liquid has a cation containing a hydrocarbon chain having six or more carbon atoms, and wherein at least one hydrogen atom in the hydrocarbon chain is substituted with a fluorine atom.