Tokyo, Japan

Naoki Umeshita

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.6

ph-index = 1


Company Filing History:


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: The Innovative Mind of Naoki Umeshita: Pioneering Substrate Processing

Introduction: Naoki Umeshita is a notable inventor based in Tokyo, Japan, recognized for his contributions to substrate processing technology. With one impressive patent to his name, Umeshita's work in the field highlights the importance of innovation in manufacturing and materials science.

Latest Patents: Umeshita's patent, titled "Substrate Processing Method and Ionic Liquid," presents a novel approach to forming a film of ionic liquid on a substrate surface. The method involves supplying the ionic liquid—characterized by a hydrocarbon chain of at least six carbon atoms, with at least one hydrogen atom substituted by a fluorine atom—onto a patterned substrate. This advancement has significant implications for improving substrate processing techniques.

Career Highlights: Umeshita is currently employed at Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. His role allows him to engage in cutting-edge research and development, directly contributing to the enhancement of technologies essential for the electronics industry.

Collaborations: Throughout his career, Umeshita has collaborated with various experts, including his coworker Takeo Nakano. Such partnerships are vital for fostering innovation and driving new developments in substrate processing methods.

Conclusion: Naoki Umeshita's inventive spirit and dedication to his craft exemplify the role of inventors in advancing technology. His patent on substrate processing showcases his commitment to innovation and sets a foundation for future advancements in the field. Umeshita's work not only benefits his company, Tokyo Electron Limited, but also contributes to the broader scientific community's understanding of ionic liquids in substrate processing.

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