The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Nov. 01, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hirokazu Ueda, Yamanashi, JP;

Yoji Iizuka, Tokyo, JP;

Mitsuaki Iwashita, Yamanashi, JP;

Antonio Rotondaro, Austin, TX (US);

Dipak Aryal, Austin, TX (US);

Takeo Nakano, Yamanashi, JP;

Ryuichi Asako, Yamanashi, JP;

Kenji Sekiguchi, Yamanashi, JP;

Koji Akiyama, Yamanashi, JP;

Naoki Umeshita, Tokyo, JP;

Takashi Hayakawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/26 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); C23C 16/26 (2013.01); C23C 16/4412 (2013.01); C23C 16/45587 (2013.01); C23C 16/50 (2013.01); H01L 21/6704 (2013.01);
Abstract

A vacuum processing apparatus includes a decompressable process container; a supply port configured to supply, to the process container, an ionic liquid that absorbs an oxidizing gas; and a discharge port configured to discharge the ionic liquid supplied to the process container. A recess is provided at a joint portion between members constituting the process container. The supply port is configured to supply the ionic liquid to the recess, and the discharge port is configured to discharge the ionic liquid supplied to the recess.


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