The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Jan. 31, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yoshimasa Watanabe, Nirasaki, JP;
Masahiro Oka, Nirasaki, JP;
Hirokazu Ueda, Nirasaki, JP;
Yuuki Yamamoto, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/511 (2006.01); C23C 16/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67063 (2013.01); C23C 16/0236 (2013.01); C23C 16/401 (2013.01); C23C 16/455 (2013.01); C23C 16/511 (2013.01); H01L 21/02112 (2013.01); H01L 21/02129 (2013.01); H01L 21/02274 (2013.01); H01L 21/31144 (2013.01);
Abstract
A method of forming a boron-based film includes forming the boron-based film mainly containing boron on a substrate by plasma CVD using plasma of a processing gas including a boron-containing gas; and controlling film stress of the formed boron-based film by adjusting a process parameter.