The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Oct. 05, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Taro Ikeda, Yamanashi, JP;
Hirokazu Ueda, Yamanashi, JP;
Eiki Kamata, Yamanashi, JP;
Mitsutoshi Ashida, Yamanashi, JP;
Isao Gunji, Yamanashi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32266 (2013.01); B08B 7/0035 (2013.01); H01J 37/3244 (2013.01); H01J 2237/335 (2013.01);
Abstract
A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwave powers from the plurality of microwave introducing modules is periodically in an OFF state for a given time.