Nirasaki, Japan

Mitsutoshi Ashida

USPTO Granted Patents = 11 

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 82(Granted Patents)


Location History:

  • Narasaki, JP (2014)
  • Nirasaki, JP (2015 - 2023)
  • Yamanashi, JP (2020 - 2023)

Company Filing History:


Years Active: 2014-2025

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: Innovations of Mitsutoshi Ashida

Introduction

Mitsutoshi Ashida is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 10 patents. His work focuses on advanced methods and apparatuses that enhance the efficiency and effectiveness of plasma applications.

Latest Patents

One of Ashida's latest patents is a plasma measurement method. This method involves measuring a plasma state using a probe device during plasma processing on a substrate. The process includes introducing process gas into a processing container and producing pulsed plasma through an electromagnetic wave pulse. An AC voltage is applied to the pulsed plasma via the probe device, which transmits a signal based on the AC voltage. The data, including current values, is measured and analyzed to obtain the state of the pulsed plasma. The frequency of the AC voltage is designed to deviate from the frequency of the electromagnetic wave pulse, ensuring that the necessary data for measurement is collected within an allowable time frame.

Another significant patent is related to a plasma processing method and apparatus. This method includes supplying gas into a processing container and intermittently supplying microwave powers from multiple microwave introducing modules. The supply of all microwave powers is periodically turned off for a specified duration, optimizing the plasma processing efficiency.

Career Highlights

Mitsutoshi Ashida is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in advancing plasma processing technologies.

Collaborations

Ashida has collaborated with notable coworkers, including Shigeru Kasai and Eiki Kamata. Their combined expertise has contributed to the development of innovative solutions in plasma technology.

Conclusion

Mitsutoshi Ashida's contributions to plasma processing through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.

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