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For the Inventor, By the Inventor

Tokyo, Japan

Hidekimi Kadokura

This inventor holds 16 USPTO granted patents. Top assignees: Kabushikikaisha Kojundokagaku Kenkyusho, Tokyo Electron Limited, Kabushikikaisha Kojundokagaku Kenyusho. Active years: 1999-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekimi Kadokura. Retrieved from https://idiyas.com/inventor/hidekimi-kadokura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16

% Patents Active = 68.8

Average Co-Inventor Count = 2.1

ph-index = 5

Forward Citations = 167(Granted Patents)


Location History:

  • Tokyo, JP (1999 - 2010)
  • Sakado, JP (2009 - 2012)

Company Filing History:

goldMedal13 out of 16 
 
Kabushikikaisha Kojundokagaku Kenkyusho
 patents
silverMedal2 out of 10,918 
 
Tokyo Electron Limited
 patents
bronzeMedal1 out of 1 
 
Kabushikikaisha Kojundokagaku Kenyusho
 patent
4. 1 out of 7 
 
Kojundo Chemical Laboratory Co., Ltd.
 patents
5. 1 out of 655 
 
Matsushita Electronics Corporation
 patents
6. 1 out of 134 
 
Symetrix Corporation
 patents
where one patent can have more than one assignee

Years Active: 1999-2012

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16 patents (USPTO):Explore Patents
1. 8293327 - Process for forming the strontium-containing thin film (2012-10-23),
2. 7816282 - [object Object] (2010-10-19),
3. 7635441 - Raw material for forming a strontium-containing thin film and process for preparing the raw material (2009-12-22),
4. 6930177 - High-purity lanthanum isoproxide and a process for producing the same (2005-08-16),
5. 6872419 - Method or process for producing PZT films at low substrate temperatures by chemical vapor deposition (2005-03-29),
6. 6593484 - TANTALUM TERTIARY AMYLIMIDO TRIS (DIMETHYLAMIDE), A PROCESS FOR PRODUCING THE SAME, A SOLUTION OF STARTING MATERIAL FOR MOCVD USING THE SAME, AND A METHOD OF FORMING A TANTALUM NITRIDE FILM USING THE SAME (2003-07-15),
7. 6472547 - Process for producing bismuth tertiary amyloxide (2002-10-29),
8. 6469189 - Liquid double alkoxide of niobium or tantalum and alkaline earth metal, production method thereof, and production method of complex metal oxide dielectric using it (2002-10-22),
9. 6426425 - Process for purifying gallium alkoxide (2002-07-30),
10. 6376692 - Zirconium alkoxytris (&bgr;-Diketonate), process for manufacturing the same, and liquid composition for formation of PZT film (2002-04-23),
11. 6207232 - Process for producing bis(alkyl-cyclopentadienyl) ruthenium complexes and process for producing ruthenium-containing films by using the same (2001-03-27),
12. 6046345 - Barium strontium .beta.-diketonates, processes for producing the same (2000-04-04),
13. 6002036 - Process for producing bis(alkyl-cyclopentadienyl)ruthenium complexes and (1999-12-14),
14. 5932281 - Method of manufacturing bi-layered ferroelectric thin film (1999-08-03),
15. 5929267 - Trimethyl(ethylcyclopentadienyl)platinum, process for producing the same (1999-07-27),

Title: Hidekimi Kadokura: Pioneering Visionary in Thin Film Technology

Introduction:

Hidekimi Kadokura, a visionary inventor based in Tokyo, Japan, is renowned for his passion for innovation and relentless pursuit of excellence. With a stellar track record of 16 patents, Kadokura's work continues to inspire and shape the future of technology, particularly in the field of thin film technology.

Latest Patents:

Kadokura's latest patents showcase his expertise in thin film technology, particularly focusing on processes for forming strontium-containing thin films using innovative materials such as bis(propyltetramethylcyclopentadienyl)strontium. These patents pave the way for advancements in creating films like SrTiO and (Ba, Sr)TiO through chemical vapor deposition or atomic layer deposition techniques.

Career Highlights:

Throughout his illustrious career, Kadokura has made significant contributions to companies such as Kabushikikaisha Kojundokagaku Kenkyusho and Tokyo Electron Limited. His innovative spirit and dedication to pushing the boundaries of thin film technology have earned him a reputation as a leading figure in the industry.

Collaborations:

Collaborating with talented individuals like Yumie Okuhara and Shintaro Higashi, Kadokura has been able to combine his expertise with the diverse skill sets of his coworkers to achieve groundbreaking advancements in thin film technology. Together, they have pioneered new processes and materials that have revolutionized the field.

Conclusion:

In conclusion, Hidekimi Kadokura's unwavering commitment to innovation and his pioneering work in thin film technology have solidified his position as a visionary inventor. His patents and collaborations serve as testaments to his ingenuity and drive to create technologies that will shape the future of the industry. Kadokura's contributions continue to inspire and pave the way for future innovations in the ever-evolving landscape of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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