The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Jan. 24, 2008
Yumiko Kawano, Nirasaki, JP;
Akinobu Kakimoto, Nirasaki, JP;
Hidekimi Kadokura, Tokyo, JP;
Shintaro Higashi, Tsurugashima, JP;
Yumiko Kawano, Nirasaki, JP;
Akinobu Kakimoto, Nirasaki, JP;
Hidekimi Kadokura, Tokyo, JP;
Shintaro Higashi, Tsurugashima, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method is used for forming an SrTiOfilm on a substrate placed and heated inside a process chamber while supplying a gaseous Ti source material, a gaseous Sr source material, and a gaseous oxidizing agent into the process chamber. Sr(C(CH))is used as the Sr source material. The method performs a plurality of cycles to form the SrTiOfilm. Each cycle sequentially includes supplying the gaseous Ti source material into the process chamber and thereby adsorbing it onto the substrate; supplying the gaseous oxidizing agent into the process chamber and thereby decomposing the Ti source material thus adsorbed and forming a Ti-containing oxide film; supplying the gaseous Sr source material into the process chamber and thereby adsorbing it onto the Ti-containing oxide film; and supplying the gaseous oxidizing agent into the process chamber and thereby decomposing the Sr source material thus adsorbed and forming an Sr-containing oxide film.