The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Feb. 17, 1999
Hidekimi Kadokura, Tokyo, JP;
Kabushikikaisha Kojundokagaku Kenkyusho, Saitama, JP;
Abstract
A Pt compound which is in the form of a liquid at room temperature for producing Pt films usable as electrode films in semiconductor devices by the CVD method; a process for producing the compound; and a process for producing films with the use of the same. A novel compound trimethyl(ethylcyclopentadienyl)platinum (C.sub.2 H.sub.5 C.sub.5 H.sub.4)Pt(CH.sub.3).sub.3 is in the form of a liquid at room temperature and shows a sufficient vapor pressure at around 35.degree. C. Thus, it can be quantitatively supplied by gas bubbling or with the use of a liquid mass flow controller as a feedstock in the CVD method and thermally decomposed on a substrate at 150.degree. C. in a hydrogen atmosphere to give pure Pt films. This compound can be produced at a high yield by reacting iodotrimethylplatinum with sodium ethylcyclopentadienide in a solvent.