logo

For the Inventor, By the Inventor

Kanagawa, Japan

Haruhito Ono

This inventor holds 32 USPTO granted patents and 1 published patent application and 5 EPO patents, primarily in Nano Fabrication. Top assignees: Canon Kabushiki Kaisha, Hitachi-High-Technologies Corporation, Hitachi, Ltd.. Active years: 1990-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruhito Ono. Retrieved from https://idiyas.com/inventor/haruhito-ono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 53.1

 

Average Co-Inventor Count = 3.5

ph-index = 10

Forward Citations = 430(Granted Patents)


Location History:

  • Minami-ashigari, JP (1993)
  • Ashigara, JP (1990 - 1999)
  • Tokyo, JP (2005)
  • Kanagawa, JP (2003 - 2006)
  • Minami-ashigara, JP (1993 - 2013)

Company Filing History:

goldMedal32 out of 92,901 
 
Canon Kabushiki Kaisha
 patents
silverMedal2 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
bronzeMedal1 out of 42,726 
 
Hitachi, Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1990-2013

Loading Chart...
Loading Chart...
Areas of Expertise:
Imprint Method
Photonic Crystal
Nano Structure
Charged Beam
Electron Optical System
Image Forming Apparatus
Etching Mask
Multi-Electron Beam Source
Deflector
Semiconductor Device
Surface Conduction
Electron Beam Generator
32 patents (USPTO):Explore Patents
1. 8361336 - Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing method (2013-01-29),
2. 8337712 - Method for forming etching mask, method for fabricating three-dimensional structure and method for fabricating three-dimensional photonic crystalline laser device (2012-12-25),
3. 8191994 - Liquid ejection head utilizing deflection members (2012-06-05),
4. 8084365 - Method of manufacturing a nano structure by etching, using a substrate containing silicon (2011-12-27),
5. 7902637 - Nano structure and method of manufacturing nano structure (2011-03-08),
6. 7727410 - Process for formation of three-dimensional photonic crystal (2010-06-01),
7. 7700390 - Method for fabricating three-dimensional photonic crystal (2010-04-20),
8. 7611810 - Charged beam processing apparatus (2009-11-03),
9. 7126141 - Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method (2006-10-24),
10. 7109494 - Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector (2006-09-19),
11. 7060984 - Multi-charged beam lens and charged beam exposure apparatus using the same (2006-06-13),
12. 7038226 - Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method (2006-05-02),
13. 6965153 - Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method (2005-11-15),
14. 6946662 - Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method (2005-09-20),
15. 6903345 - Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method (2005-06-07),

Title: Haruhito Ono – A Pioneer in Imprint and Etching Technologies

Introduction

Haruhito Ono is a distinguished inventor based in Kanagawa, Japan, known for his innovative contributions to imprint and etching technologies. With an impressive portfolio of 32 patents, Ono has made significant advancements in the field of material processing, particularly focusing on resin materials and fabrication techniques.

Latest Patents

Ono's latest patents reflect his expertise and innovative spirit. One of his notable inventions is an imprint method for imprinting a pattern of a mold onto a resin material on a substrate. This method involves creating a processed area where an imprint pattern is formed, along with a protection layer to safeguard the processed area during further steps. Additionally, he has developed a method for forming an etching mask, which uses a focused ion beam to create an etching mask necessary for oblique etching. Furthermore, he has patented methods for fabricating three-dimensional structures, which include using the formed etching mask for precise material removal, thereby creating advanced photonic crystalline laser devices.

Career Highlights

Throughout his career, Ono has worked with prominent companies such as Canon and Hitachi High-Technologies Corporation, where he applied his skills to further enhance technologies in imaging and nanofabrication. His contributions to these organizations have played a vital role in pushing the boundaries of current technological capabilities.

Collaborations

Ono has collaborated with talented individuals during his career, including notable coworkers Masahiko Okunuki and Hidetoshi Suzuki. Together, they have contributed to groundbreaking technologies that have garnered numerous patents and driven innovation in their respective fields.

Conclusion

Haruhito Ono is a notable figure in the realm of inventions, especially in imprint methods and etching technology. With his extensive patent portfolio and collaborative efforts, Ono continues to impact the field significantly, paving the way for future innovations that promise to enhance our technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…