The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Feb. 07, 2007
Shinan Wang, Kashiwa, JP;
Kenji Tamamori, Ebina, JP;
Haruhito Ono, Minamiashigara, JP;
Masahiko Okunuki, Akiruno, JP;
Shinan Wang, Kashiwa, JP;
Kenji Tamamori, Ebina, JP;
Haruhito Ono, Minamiashigara, JP;
Masahiko Okunuki, Akiruno, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A process for forming a three-dimensional photonic crystal comprises the steps of providing a base material having a first face and a second face adjoining to each other at a first angle, forming a first mask on the first face, dry-etching the first face in a direction at a second angle to the first face to remove a portion of the base material not protected by the first mask, forming a second mask on the second face, and dry-etching the second face in a direction at a third angle to the second face to remove a portion of the base material not protected by the second mask.