Gyu-Hee Park

USPTO Granted Patents = 17 (Patent Applications = 2)

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 15(Granted Patents)

Company Filing History:

17 out of 131,214

Samsung Electronics Co., Ltd.

L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude

patents

where one patent can have more than one assignee

Years Active: 2016-2024

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17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12051586 - Method of manufacturing semiconductor device (2024-07-30),

2. 11901191 - Atomic layer etching method and semiconductor device manufacturing method using the same (2024-02-13),

3. 11524973 - Metal compounds and methods of fabricating semiconductor devices using the same (2022-12-13),

4. 11332486 - Aluminum compound and method for manufacturing semiconductor device using the same (2022-05-17),

5. 11081389 - Method of manufacturing semiconductor device (2021-08-03),

6. 10913754 - Lanthanum compound and methods of forming thin film and integrated circuit device using the lanthanum compound (2021-02-09),

7. 10847362 - Method of fabricating semiconductor device (2020-11-24),

8. 10752645 - Method of forming a thin film (2020-08-25),

9. 10600643 - Method of forming thin film and method of manufacturing integrated circuit device using the same (2020-03-24),

10. 10329312 - Lanthanum compound, method of synthesizing lanthanum compound, lanthanum precursor composition, method of forming thin film, and method of manufacturing integrated circuit device (2019-06-25),

11. 10259836 - Methods of forming thin film and fabricating integrated circuit device using niobium compound (2019-04-16),

12. 10242877 - Aluminum compound and methods of forming thin film and fabricating integrated circuit device by using the same (2019-03-26),

13. 10224200 - Aluminum compound, method of forming thin film by using the same, and method of fabricating integrated circuit device (2019-03-05),

14. 9923047 - Method for manufacturing a capacitor for semiconductor devices (2018-03-20),

15. 9790246 - Nickel compound and method of forming thin film using the nickel compound (2017-10-17),

Title: Gyu-Hee Park: Innovator in Semiconductor Technology

Introduction

Gyu-Hee Park is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 17 patents. His innovative approaches have advanced the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents is a method of manufacturing a semiconductor device. This method involves providing a metal precursor on a substrate and utilizing a reactant and a co-reactant to form a metal nitride layer. The reactant serves as a nitrogen source, while the co-reactant is an organometallic compound. Another notable patent is an atomic layer etching method that allows for precise etching of a metal thin film at atomic layer units. This method includes forming a metal layer on a substrate and executing at least one etching cycle with active and support gases.

Career Highlights

Gyu-Hee Park has worked with leading companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Adeka Corporation. His experience in these organizations has equipped him with the knowledge and skills necessary to innovate in semiconductor manufacturing.

Collaborations

Throughout his career, Gyu-Hee Park has collaborated with notable colleagues such as Youn-Joung Cho and Jae-Soon Lim. These partnerships have contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Gyu-Hee Park's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing.

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2 patents pending:

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