Inventors with similar research interests:
Location History:
- Beaveton, OR (US) (2022)
- Hillsoboro, OR (US) (2023)
- Hillsboro, OR (US) (2006 - 2024)
- Beaverton, OR (US) (2017 - 2024)
Years Active: 2006-2025
Title: Gilbert Dewey: Pioneering Innovator with Over 300 Patents
Introduction:
Gilbert Dewey is a renowned inventor and innovator hailing from Hillsboro, Oregon. With an impressive portfolio of 318 patents, Dewey has left an indelible mark on the field of integrated circuits and oxide formation. His groundbreaking work in gate-all-around integrated circuit structures and oxide volume formation has positioned him as a highly respected figure in the industry. Let's delve deeper into his latest patents, career highlights, and notable collaborations.
Latest Patents:
Among Dewey's latest patents, two significant breakthroughs stand out. The first, titled "Gate-all-around integrated circuit structures having depopulated channel structures using multiple bottom-up oxidation approaches," describes an integrated circuit structure involving a vertical arrangement of oxide nanowires around a conductive gate electrode. This innovation enables enhanced performance in integrated circuit design.
The second patent, "Forming an oxide volume within a fin," focuses on the formation of oxide volumes within a Si fin. Dewey's inventive process involves applying a catalytic oxidant material on the fin's side or introducing oxygen ions into the fin through plasma or beam-line implant techniques. The resulting volumes of oxide hold immense potential for the manufacturing of transistors, stacked transistors, and even three-dimensional (3-D) monolithic stacked transistors.
Career Highlights:
Dewey's illustrious career spans influential roles in prominent companies such as Intel Corporation and Google Inc. At Intel, he spearheaded cutting-edge research and development initiatives, contributing significantly to advancements in integrated circuits and semiconductor technology. His expertise in designing gate-all-around integrated circuit structures and developing efficient methods for forming oxide volumes within fins has substantially impacted the industry.
Collaborations:
Throughout his career, Dewey has had the privilege of collaborating with some remarkable individuals. Notable among them are Jack T Kavalieros and Willy Rachmady. Together, they have achieved remarkable milestones, combining their expertise and pushing the boundaries of innovation in their respective fields. These collaborations have fostered cross-pollination of ideas, resulting in groundbreaking inventions that have transformed the industry.
Conclusion:
Gilbert Dewey stands as a pioneer in the realm of integrated circuits and oxide formation, boasting a remarkable portfolio of 318 patents. His inventive spirit and dedication to advancing technology have led to the development of gate-all-around integrated circuit structures and novel techniques for forming oxide volumes within fins. Through his career at Intel Corporation and Google Inc., Dewey has reshaped the landscape of semiconductor technology and left an inspiring legacy for future innovators to build upon.
As we look to the future, it is clear that Gilbert Dewey's contributions will continue to drive progress and lead the way for further advancements in the field of integrated circuits and beyond.
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