Schoonhoven, Netherlands

Gert-Jan Heerens



Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 62(Granted Patents)


Company Filing History:


Years Active: 2004-2012

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17 patents (USPTO):Explore Patents

Title: The Innovative Mind of Gert-Jan Heerens: Revolutionizing Lithographic Apparatus Technology

Introduction: Gert-Jan Heerens, the brilliant mind hailing from Schoonhoven, NL, is a prolific inventor with an impressive portfolio of 17 patents. His groundbreaking work has significantly impacted the field of lithographic apparatus technology, particularly in the realm of mask transport systems and reticle assemblies.

Latest Patents: Gert-Jan's recent patents showcase his expertise in designing cutting-edge technologies for lithographic applications. One of his latest inventions includes a Mask Transport System configured to efficiently transport masks into and out of lithographic apparatuses. This system incorporates innovative features such as translucent containers for contamination detection and precise mask handling. Additionally, his assembly of a reticle holder and reticle demonstrates his attention to detail in positioning and aligning critical components within lithographic equipment.

Career Highlights: Gert-Jan Heerens is a distinguished inventor affiliated with ASML Netherlands B.V., a prominent player in the semiconductor industry known for its advanced lithography solutions. His tenure at ASML has been marked by a series of successful patent applications that have propelled the company's technological advancements forward. Gert-Jan's contributions have not only enhanced ASML's product offerings but have also solidified his reputation as a visionary in the field.

Collaborations: Throughout his career, Gert-Jan has had the privilege of collaborating with esteemed professionals in the industry. Some of his notable coworkers include Bastiaan Lambertus Wilhelmus Marinus Van De Ven and Erik Leonardus Ham, who have worked alongside him in developing innovative solutions for lithographic challenges. The synergy among these experts has led to the creation of groundbreaking technologies that are shaping the future of lithography.

Conclusion: Gert-Jan Heerens stands as a trailblazer in the world of lithographic apparatus technology, with a track record of innovation that has left a lasting impact on the industry. His inventive spirit, coupled with his dedication to precision engineering, continues to inspire advancements in semiconductor manufacturing. As he continues to push the boundaries of technological possibilities, Gert-Jan remains a key figure in driving progress and shaping the landscape of modern lithography.

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