The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Jun. 12, 2009
Gert-jan Heerens, Schoonhoven, NL;
Gert-Jan Heerens, Schoonhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile