The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Sep. 10, 2003
Applicant:
Gert-jan Heerens, Schoonhoven, NL;
Inventor:
Gert-Jan Heerens, Schoonhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
Heerens, Gert-Jan. (2007). Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus (U.S. Patent No. 7306680). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7306680
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile