The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Dec. 27, 2005
Hubert Adriaan Van Mierlo, Maassluis, NL;
Gert-jan Heerens, Schoonhoven, NL;
Hans Meiling, Waalre, NL;
Antonius Gerardus Theodorus Maria Bastein, Leiden, NL;
Jacques Cor Johan Van Der Donck, Alphen aan den Rijn, NL;
Hedser Van Brug, The Hague, NL;
Hubert Adriaan Van Mierlo, Maassluis, NL;
Gert-Jan Heerens, Schoonhoven, NL;
Hans Meiling, Waalre, NL;
Antonius Gerardus Theodorus Maria Bastein, Leiden, NL;
Jacques Cor Johan Van der Donck, Alphen aan den Rijn, NL;
Hedser Van Brug, The Hague, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.