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For the Inventor, By the Inventor

Fremont, CA, United States of America

Frank Lin

USPTO Granted Patents = 17

Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 141(Granted Patents)


Company Filing History:

goldMedal16 out of 3,768 
 
Lam Research Corporation
 patents
silverMedal1 out of 11 
 
Cutek Research, Inc.
 patents

Years Active: 1999-2018

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17 patents (USPTO):Explore Patents
1. 9865472 - Fabrication of a silicon structure and deep silicon etch with profile control (2018-01-09),
2. 9330926 - Fabrication of a silicon structure and deep silicon etch with profile control (2016-05-03),
3. 8871105 - Method for achieving smooth side walls after Bosch etch process (2014-10-28),
4. 8668805 - Line end shortening reduction during etch (2014-03-11),
5. 8609548 - Method for providing high etch rate (2013-12-17),
6. 8480913 - Plasma processing method and apparatus with control of plasma excitation power (2013-07-09),
7. 7682980 - Method to improve profile control and N/P loading in dual doped gate applications (2010-03-23),
8. 7491343 - Line end shortening reduction during etch (2009-02-17),
9. 7407597 - Line end shortening reduction during etch (2008-08-05),
10. 7186661 - Method to improve profile control and N/P loading in dual doped gate applications (2007-03-06),
11. 6897156 - Vacuum plasma processor method (2005-05-24),
12. 6646385 - Plasma excitation coil (2003-11-11),
13. 6617257 - Method of plasma etching organic antireflective coating (2003-09-09),
14. 6531029 - Vacuum plasma processor apparatus and method (2003-03-11),
15. 6514378 - Method for improving uniformity and reducing etch rate variation of etching polysilicon (2003-02-04),

Title: Frank Lin: Innovator in Silicon Fabrication

Introduction

Frank Lin is a prominent inventor based in Fremont, CA, with a remarkable portfolio of 17 patents. His work primarily focuses on advancements in silicon fabrication, contributing significantly to the field of semiconductor technology.

Latest Patents

Among his latest patents is a method for the fabrication of a silicon structure and deep silicon etch with profile control. This innovative technique involves etching features into a silicon layer using a steady-state gas flow. The process utilizes an etch gas that comprises both an oxygen-containing gas and a fluorine-containing gas. A plasma is generated from the etch gas, and subsequently, the flow of the etch gas is halted, showcasing a sophisticated approach to silicon etching.

Career Highlights

Frank Lin has had a distinguished career, working with notable companies such as Lam Research Corporation and Cutek Research, Inc. His contributions to these organizations have been instrumental in advancing silicon fabrication technologies.

Collaborations

Throughout his career, Frank has collaborated with talented individuals, including Tuqiang Q Ni and Jaroslaw Walery Winniczek. These partnerships have fostered innovation and have led to significant advancements in their respective fields.

Conclusion

Frank Lin's contributions to silicon fabrication and his extensive patent portfolio highlight his role as a leading inventor in the semiconductor industry. His innovative methods continue to influence the field and pave the way for future advancements.

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