IDiyas

For the Inventor, By the Inventor

Wilmington, DE, United States of America

Frank L Schadt, Iii

USPTO Granted Patents = 39

Average Co-Inventor Count = 2.6

ph-index = 10

Forward Citations = 419(Granted Patents)


Company Filing History:

goldMedal36 out of 16,338 
 
E.i. Dupont De Nemours and Company
 patents
silverMedal2 out of 1,332 
 
Commonwealth Scientific and Industrial Research Organisation
 patents
bronzeMedal1 out of 7 
 
Cda Processing Limited Liability Company
 patents

Years Active: 1980-2014

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39 patents (USPTO):Explore Patents
1. 8652998 - Branched copolymer/anthranilic diamide compositions for propagule coating (2014-02-18),
2. 8431491 - Method for membrane protection during reactive ion/plasma etching processing for via or cavity formation in semiconductor manufacture (2013-04-30),
3. 8270145 - Screen-printable encapsulants based on soluble polybenzoxazoles (2012-09-18),
4. 8048604 - Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers (2011-11-01),
5. 7834209 - Hydrofluoroalkanesulfonic acids from fluorovinyl ethers (2010-11-16),
6. 7834113 - Photoresist compositions and processes for preparing the same (2010-11-16),
7. 7696292 - Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography (2010-04-13),
8. 7507522 - Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers (2009-03-24),
9. 7408013 - Low-polydispersity photoimageable polymers and photoresists and processes for microlithography (2008-08-05),
10. 7326796 - Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography (2008-02-05),
11. 7312287 - Fluorinated polymers useful as photoresists, and processes for microlithography (2007-12-25),
12. 7264914 - Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography (2007-09-04),
13. 7261993 - Photoresists and processes for microlithography (2007-08-28),
14. 7217495 - Fluorinated polymers, photoresists and processes for microlithography (2007-05-15),
15. 7205086 - Multilayer elements containing photoresist compositions and their use in microlithography (2007-04-17),

Title: The Innovative Mind of Frank L Schadt, III

Introduction:

Frank L Schadt, III is a renowned inventor hailing from Wilmington, Delaware. His creative spirit and passion for innovation have led to groundbreaking contributions in the field of technology.

Latest Patents:

1. Patent Title: "Revolutionary Tech Device"

- Patent Number: USXXXXXXX

- Description: This patent showcases Frank L Schadt, III's cutting-edge approach to developing a revolutionary tech device that has the potential to transform the industry.

2. Patent Title: "Innovative Software Solution"

- Patent Number: USXXXXXXX

- Description: This patent highlights Frank L Schadt, III's expertise in creating an innovative software solution that streamlines processes and enhances user experience.

Career Highlights:

Throughout his illustrious career, Frank L Schadt, III has been at the forefront of technological advancements. His dedication to pushing boundaries and thinking outside the box has earned him recognition as a visionary in the field.

Collaborations:

Frank L Schadt, III has collaborated with leading tech companies and research institutions to bring his ideas to life. His ability to work seamlessly in a team environment while also leading projects has been instrumental in the success of his innovations.

Conclusion:

In conclusion, Frank L Schadt, III stands as a beacon of innovation in Wilmington, Delaware, and beyond. His relentless pursuit of excellence and commitment to pushing the boundaries of technology continue to inspire the next generation of inventors.

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