The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Oct. 30, 2009
Chester E. Balut, Atkinson, NH (US);
Frank Leonard Schadt, Iii, Wilmington, DE (US);
Stephen E. Vargo, Arcadia, CA (US);
Chester E. Balut, Atkinson, NH (US);
Frank Leonard Schadt, III, Wilmington, DE (US);
Stephen E. Vargo, Arcadia, CA (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
A method for protecting a chuck membrane in a reactive ion etcher during plasma processing is described. The method utilizes a photoresist as a protective layer. Suitable photoresists can be used in this invention to not only image a semiconductor substrate to protect areas where vias and/or cavities are not desired during plasma processing but also to protect the chuck membrane(s) of the reactive ion etcher from being damaged and/or contaminated during plasma processing. Both negative-working and positive-working photoresists can be used.