The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
Jul. 09, 2004
Andrew Edward Feiring, Wilmington, DE (US);
Jerald Feldman, Hockessin, DE (US);
Frank Leonard Schadt, Iii, Wilmington, DE (US);
Andrew Edward Feiring, Wilmington, DE (US);
Jerald Feldman, Hockessin, DE (US);
Frank Leonard Schadt, III, Wilmington, DE (US);
E I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.