The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
May. 17, 2005
Michael Karl Crawford, Glen Mills, PA (US);
Hoang Vi Tran, Wilmington, DE (US);
Frank Leonard Schadt, Iii, Wilmington, DE (US);
Fredrick Claus Zumsteg, Jr., Wilmington, DE (US);
Andrew Edward Feiring, Wilmington, DE (US);
Michael Fryd, Philadelphia, PA (US);
Michael Karl Crawford, Glen Mills, PA (US);
Hoang Vi Tran, Wilmington, DE (US);
Frank Leonard Schadt, III, Wilmington, DE (US);
Fredrick Claus Zumsteg, Jr., Wilmington, DE (US);
Andrew Edward Feiring, Wilmington, DE (US);
Michael Fryd, Philadelphia, PA (US);
E. I. DuPont de Nemours and Company, Wilmington, DE (US);
Abstract
The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.