The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2010

Filed:

Mar. 29, 2006
Applicants:

James R. Sounik, Corpus Christi, TX (US);

Frank Leonard Schadt, Iii, Wilmington, DE (US);

Michael Fryd, Philadelphia, PA (US);

Inventors:

James R. Sounik, Corpus Christi, TX (US);

Frank Leonard Schadt, III, Wilmington, DE (US);

Michael Fryd, Philadelphia, PA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 4/04 (2006.01); C08F 2/00 (2006.01); C08F 118/02 (2006.01); C08F 12/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to novel photoresist compositions and processes for preparing the same utilizing polymers having a low polydispersity via the use of certain chain transfer agents (CTA) with certain monomers to provide said polymers. The polymers incorporating the chain transfer agents can be homopolymers, or made with additional monomers to provide copolymers. These polymers/copolymers are then converted into photoresist compositions for use as such.


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