The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Aug. 08, 2003
Andrew E. Feiring, Wilmington, DE (US);
Frank L Schadt, Iii, Wilmington, DE (US);
Viacheslav Alexandrovich Petrov, Hockessin, DE (US);
Bruce Edmund Smart, Wilmington, DE (US);
William Brown Farnham, Hockessin, DE (US);
Andrew E. Feiring, Wilmington, DE (US);
Frank L Schadt, III, Wilmington, DE (US);
Viacheslav Alexandrovich Petrov, Hockessin, DE (US);
Bruce Edmund Smart, Wilmington, DE (US);
William Brown Farnham, Hockessin, DE (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other components. The polymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.