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For the Inventor, By the Inventor

Hockessin, DE, United States of America

William Brown Farnham

USPTO Granted Patents = 65 

 

Average Co-Inventor Count = 2.0

ph-index = 18

Forward Citations = 773(Granted Patents)


Inventors with similar research interests:


Location History:

  • Wilmington, DE (US) (1979 - 1999)
  • San Pedro, CA (US) (2000 - 2002)
  • Newark, DE (US) (2003)
  • Hockessin, DE (US) (1992 - 2017)

Company Filing History:

goldMedal56 out of 16,338 
 
E.i. Dupont De Nemours and Company
 patents
silverMedal2 out of 1,332 
 
Commonwealth Scientific and Industrial Research Organisation
 patents
bronzeMedal1 out of 43 
 
E. I. Du Pont Nemours and Co.
 patents
4. 1 out of 8 
 
E.i. Du Pont De Nmeours and Company
 patents
5. 1 out of 2 
 
Ontro, Inc.
 patents
6. 1 out of 228 
 
Munchkin, Inc.
 patents
7. 1 out of 2 
 
I. Du Pont De Nemours and Company
 patents
8. 2 out of 832,680 
Other
 patents

Years Active: 1979-2017

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65 patents (USPTO):Explore Patents
1. 9815947 - Substantially symmetrical 3-arm star block copolymers (2017-11-14),
2. 9169383 - Preparation, purification and use of high-X diblock copolymers (2015-10-27),
3. 8304572 - Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom (2012-11-06),
4. 8034534 - Fluorinated polymers for use in immersion lithography (2011-10-11),
5. 7807755 - Method for removing sulfur-containing end groups (2010-10-05),
6. 7696292 - Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography (2010-04-13),
7. 7632966 - Synthesis of trithiocarbonate raft agents and intermediates thereof (2009-12-15),
8. 7326796 - Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography (2008-02-05),
9. 7312287 - Fluorinated polymers useful as photoresists, and processes for microlithography (2007-12-25),
10. 7264914 - Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography (2007-09-04),
11. 7101938 - Method for forming fluorinated ionomers (2006-09-05),
12. 7022457 - Photoresists with hydroxylated, photoacid-cleavable groups (2006-04-04),
13. 6777515 - Functional fluorine-containing polymers and ionomers derived therefrom (2004-08-17),
14. 6743549 - Nonaqueous electrolyte lithium secondary batteries (2004-06-01),
15. 6713567 - Method for forming fluorinated ionomers (2004-03-30),

Title: The Legacy of William Brown Farnham: Pioneering Inventor from Hockessin

Introduction:

William Brown Farnham, a distinguished inventor hailing from Hockessin, Delaware, has made significant contributions to the field of innovation with his groundbreaking creations.

Latest Patents:

Farnham's latest patents showcase his ingenuity and forward-thinking approach to problem-solving, with a focus on improving everyday life through technological advancements.

Career Highlights:

Throughout his illustrious career, Farnham has been recognized for his innovative spirit and dedication to pushing the boundaries of what is possible. His inventions have not only garnered acclaim but have also improved the lives of many.

Collaborations:

Farnham's collaborative efforts with fellow inventors, researchers, and industry experts have been instrumental in bringing his ideas to life. By working together, they have been able to achieve remarkable results and drive progress in the world of innovation.

Conclusion:

In conclusion, William Brown Farnham stands as a beacon of creativity and excellence in the realm of invention. His pioneering spirit and relentless pursuit of innovation continue to inspire generations of inventors to think outside the box and create a better future for all.

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