The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2010

Filed:

Sep. 16, 2004
Applicants:

William Brown Farnham, Hockessin, DE (US);

Michael Fryd, Philadelphia, PA (US);

Frank Leonard Schadt, Iii, Wilmington, DE (US);

Inventors:

William Brown Farnham, Hockessin, DE (US);

Michael Fryd, Philadelphia, PA (US);

Frank Leonard Schadt, III, Wilmington, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 20/00 (2006.01); C08F 2/00 (2006.01); G03C 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.


Find Patent Forward Citations

Farnham, William. (2010). Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography (U.S. Patent No. 7696292). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7696292

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…