The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Sep. 24, 2003
William Brown Farnham, Hockessin, DE (US);
Andrew Edward Feiring, Wilmington, DE (US);
Frank Leonard Schadt, Iii, Wilmington, DE (US);
Weiming Qiu, Wilmington, DE (US);
William Brown Farnham, Hockessin, DE (US);
Andrew Edward Feiring, Wilmington, DE (US);
Frank Leonard Schadt, III, Wilmington, DE (US);
Weiming Qiu, Wilmington, DE (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.