The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Feb. 11, 2013
Applicant:
E I Du Pont DE Nemours and Company, Wilmington, DE (US);
Inventors:
William Brown Farnham, Hockessin, DE (US);
Michael Thomas Sheehan, Corpus Christi, TX (US);
Hoang Vi Tran, Wilmington, DE (US);
Assignee:
E I DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 53/00 (2006.01); C08L 33/06 (2006.01); C08F 6/12 (2006.01); C08F 6/14 (2006.01); C08F 293/00 (2006.01);
U.S. Cl.
CPC ...
C08L 53/00 (2013.01); C08F 6/12 (2013.01); C08F 6/14 (2013.01); C08F 293/005 (2013.01);
Abstract
This invention relates to the preparation and purification of high-X ('chi') diblock copolymers. Such copolymers contain two segments ('blocks') of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.