The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2007

Filed:

Aug. 19, 2003
Applicants:

Andrew Edward Feiring, Wilmington, DE (US);

Frank L. Schadt, Iii, Wilmington, DE (US);

William Brown Farnham, Hockessin, DE (US);

Jerald Feldman, Wilmington, DE (US);

Inventors:

Andrew Edward Feiring, Wilmington, DE (US);

Frank L. Schadt, III, Wilmington, DE (US);

William Brown Farnham, Hockessin, DE (US);

Jerald Feldman, Wilmington, DE (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 120/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.


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