This inventor holds 33 USPTO granted patents, primarily in Fluoropolymer Chemistry. Top assignees: E.i. Dupont De Nemours and Company, Baylor University, E. I. Du Pont Nemours and Co.. Active years: 1976-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
32 out of 16,339 
1 out of 200 
1 out of 43 
Years Active: 1976-2008
Areas of Expertise:
Title: Bruce E. Smart: Innovator in Microlithography and Photoresists
Introduction: Bruce E. Smart is an accomplished inventor based in Wilmington, DE, with a remarkable portfolio of 33 patents. His work predominantly focuses on the development of photoresists and fluoropolymers, integral to the field of microlithography used in semiconductor manufacturing.
Latest Patents: Among his latest innovations, Bruce E. Smart has contributed significant advancements in photoresist technologies. One notable patent details a polymer composition featuring repeat units derived from ethylenically unsaturated compounds that contain fluorine atoms, optimizing processes for 157 nm microlithography. This invention enhances the fabrication of photoresist compositions crucial for semiconductor devices.
Another key patent includes novel fluorine-containing copolymers designed to elevate the performance of photoimaging compositions. These copolymers combine fluorinated olefins with polycyclic ethylenically unsaturated monomers that possess fused 4-membered heterocyclic rings. The copolymers are particularly advantageous in creating photoresist materials with high UV transparency, especially at short wavelengths, making them vital in advancing semiconductor production.
Career Highlights: Throughout his prestigious career, Bruce has worked with notable companies including E.I. Du Pont De Nemours and Company, a pioneer in the field of chemical manufacturing and innovation. His expertise has led to substantial contributions in the development of materials essential for modern technology.
Collaborations: Bruce E. Smart has collaborated with esteemed professionals in his field, including Andrew Edward Feiring and Viacheslav Alexandrovich Petrov. These partnerships have fostered an environment of innovation, enabling the advancement of technologies that continue to influence the semiconductor industry.
Conclusion: Bruce E. Smart stands out as a significant figure in the realm of microlithography and photoresist development. His extensive portfolio of patents illustrates his commitment to innovation and the advancement of technology, marking his legacy in the field of semiconductor materials manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile