E.i. Dupont De Nemours and Company

Baylor University

E. I. Du Pont Nemours and Co.

Bruce E Smart

Viacheslav Alexandrovich Petrov

Andrew Edward Feiring

Robert Clayton Wheland

Carl G Krespan

William Brown Farnham

Zhen-Yu Yang

Robert K Kobos

Colin Anolick

Weiming Qiu

Prabhakar Kondaji Jadhav

Rene Arentzen

Frank L Schadt, Iii

Charles W Stewart, Sr

Owen W Webster

Charles Winfield Stewart

Shlomo M Rozen

Norman Herron

Leo Ernest Manzer

Kostantinos Kourtakis

Paul R Resnick

Zhibin Guan

Joe Douglas Druliner

Wesley Memeger, Jr

Samuel L Lane

Theodore Arthur Treat

Stephen Paul Jordan

Patrick Boivin

Rene Arenzen

William H Scouten

The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and Rto Rare independently H; C-Calkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C-Caryl. These polymers can be used in making photoresist compositions and coated substrates. 

Photoresists, fluoropolymers and processes for 157 nm microlithography

The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography

This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other components. The polymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography

Disclosed herein are novel amorphous tetrafluoroethylene-hexafluoropropylene (TFE-HFP) dipolymers, and other copolymers containing TFE, HFP and a third monomer, many of which are more random than previous amorphous TFE-HFP copolymers, as well as a novel high productivity continuous process for making these polymers. The polymers are particularly useful in the form of coatings, films and encapsulants.

Amorphous tetrafluoroethylene-hexafluoropropylene copolymers

An improved process for decomposing alkyl or aromatic hydroperoxides to form a decomposition reaction mixture containing the corresponding alcohol and ketone. The improvement relates to decomposing the hydroperoxide by contacting the hydroperoxide with a catalytic amount of a heterogenous catalyst of Au, Ag, Cu or a sol-gel compound containing particular combinations of Fe, Ni, Cr, Co, Zr, Ta, Si, Mg, Nb, Al and Ti wherein certain of those metals have been combined with an oxide, such as an inorganic matrix of hydroxides or oxides, or combinations thereof. The catalysts may also optionally be supported on a suitable support member and used in the presence of an additional metal.

Hydroperoxide decomposition process

Exposing to visible light atom transfer radical polymerizations of vinyl monomers that use transition metal compounds often results in faster polymerizations and/or the need for less transition metal compound. Disclosed is a process for the polymerization of vinyl monomers by atom transfer radical polymerization using a first compound containing a transition metal and a second compound capable of radically transferring an atom or group to said first compound, wherein the improvement comprises, irradiating with visible light with an intensity of at least about 5 mW/cm.sup.2 a liquid in which said polymerization is taking place. The polymers made are useful for molding resins and coatings.

Atom transfer radical polymerization

Disclosed herein is a process in which fluorine containing olefins are polymerized using an initiation system which is a combination of a fluoroaliphatic sulfinate or sulfinic acid and chlorate, bromate or hypochlorite ions. The resulting polymer contains fewer deleterious end groups and is more stable and/or easier to process. The polymers produced are useful as thermoplastics and elastomers.

Process for making fluoropolymers

This invention relates to the telomerization of polyfluoroalkyl iodides with polyfluoroolefins in the presence of strong fluorooxidizer initiators. The products obtained are useful in the production of surfactants and oil repellants.

Initiators for telomerization of polyfluoroalkyl iodides with

Selected partially fluorinated .alpha.,.omega.-dienes can be (co)polymerized to form polymers in which cyclic structures are present. A novel free radical polymerization process, in which the polymer obtained is dependent on the initiator used, is described. The polymers are useful for films, coatings and molded parts.

Partially flourinated polymers and process therefor

Disclosed is a process for preparing polyether ketones comprising reacting one or more bihaloaryl ketones in the presence of a catalyst, co-catalyst and solvent.

Process for preparing polyether ketones

This invention concerns a process for the preparation of polyfluorooxetanes by the reaction of fluoroketones or fluoroepoxides with haloethylenes in the presence of a Lewis acid catalyst. Polyfluorooxetanes are useful as solvents and plasticizers having high thermal stability.

Process for preparing polyfluorooxetanes

Poly(fluoroalkyl) sugar reagents are prepared containing a sugar such as a monosaccharide or a disaccharide to which are bonded a plurality of fluoroalkyl anchor groups capable of attaching to a fluorocarbon surface, and either a reactive group capable of covalent coupling to a biomolecule such as an enzyme or a charged group to form an ion-exchanger or a non-ionic group to give a neutral fluorosurfactant. A spacer may be between the reactive group and the sugar. The poly(fluoroalkyl) sugar reagents are strongly adsorbed onto fluorocarbon surfaces to provide supports for such applications as separation and immobilization of biomolecules such as enzymes, carrying out heterogeneous diagnostic assays, and preparation of biosensors.

Immobilization of biomolecules on a fluorocarbon surface with a

Disclosed herein are novel amorphous tetrafluoroethylene/hexafluoropropylene (TFE/HFP) copolymers, which are more random than previous amorphous TFE/HFP copolymers, as well as a novel high productivity continuous process for making these polymers. The polymers are particularly useful in the form of coatings, films and encapsulants.

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Wilmington, DE, United States of America

Bruce E Smart