The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Nov. 26, 2001
Larry L. Berger, Chadds Ford, PA (US);
Frank L. Schadt, Iii, Wilmington, DE (US);
Larry L. Berger, Chadds Ford, PA (US);
Frank L. Schadt, III, Wilmington, DE (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(R)(R')OH, wherein Rand R′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CXCYwhere X═F or CFand Y═—H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CXCY; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.