Hsinchu County, Taiwan

Feng-Yuan Chiu


Average Co-Inventor Count = 6.8

ph-index = 2

Forward Citations = 70(Granted Patents)


Location History:

  • Hsinchu, TW (2016)
  • Zhudong Township, TW (2014 - 2017)
  • Hsinchu County, TW (2012 - 2018)

Company Filing History:


Years Active: 2012-2018

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7 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Feng-Yuan Chiu from Hsinchu County, TW

Introduction

Feng-Yuan Chiu is an accomplished inventor based in Hsinchu County, Taiwan, known for his significant contributions to the field of integrated circuit fabrication. With a portfolio of seven patents, Chiu has developed innovative solutions that enhance the efficiency and accuracy of photomasks used in semiconductor manufacturing.

Latest Patents

Among his latest patents is one that focuses on a photomask and a method for fabricating integrated circuits. This invention presents a novel design layout that incorporates a multitude of main features and additional assistant features strategically placed in an assistant region. This method improves optical proximity correction (OPC) by ensuring the assistant region, lacking main features, significantly exceeds the width of the main features. The resulting photomask enhances the precision of critical dimensions, which is vital for successful integrated circuit fabrication.

Career Highlights

Chiu has built a robust career working with leading technology firms, including Taiwan Semiconductor Manufacturing Company Limited and Promos Technologies, Inc. These positions allowed him to apply his innovative thinking and technical knowledge to real-world challenges in the semiconductor industry, contributing to advances in integrated circuit technology.

Collaborations

Throughout his career, Chiu has collaborated with notable professionals in his field, including Ying-Chou Cheng and Ru-Gun Liu. These partnerships have facilitated knowledge sharing and the development of groundbreaking technologies in the realm of integrated circuits.

Conclusion

Feng-Yuan Chiu exemplifies the spirit of innovation and dedication in the field of semiconductor technology. His patents and contributions to photomask technology underscore the importance of enhancing fabrication processes for integrated circuits. As the industry continues to evolve, inventors like Chiu remain at the forefront, driving progress and shaping the future of technology.

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