The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Feb. 17, 2017
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Chun-Yu Lin, Hsinchu, TW;
Yi-Jie Chen, Hsinchu, TW;
Feng-Yuan Chiu, Hsinchu County, TW;
Ying-Chou Cheng, Zhubei, TW;
Kuei-Liang Lu, Hsinchu, TW;
Ya-Hui Chang, Hsinchu, TW;
Ru-Gun Liu, Zhubei, TW;
Tsai-Sheng Gau, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A photomask and method for fabricating an integrated circuit is provided. A design layout is provided, wherein the design layout has a plurality of main features. A plurality of assistant features are added in an assistant region of the design layout to form a first layout, wherein the assistant region has no main feature and a width of the assistant region is larger than five times of a width of the main feature. A plurality of optical proximity correction (OPC) features are added on the first layout to form a second layout. And a photomask is formed according to the second layout.