The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Nov. 13, 2013
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
I-Chang Shih, Zhubei, TW;
Feng-Yuan Chiu, Zhudong Township, TW;
Ying-Chou Cheng, Zhubei, TW;
Chiu Hsiu Chen, Zhubei, TW;
Ru-Gun Liu, Zhubei, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
Integrated circuit design techniques are disclosed. In some methods, a target layout design having a geometric pattern thereon is received. A set of fast-bias contour (FBC) rules is applied to the target layout design to provide an electronic photomask having FBC-edits. The FBC-edits differentiate the electronic photomask from the target layout design, and the FBC rules are applied without previously applying optical proximity correction (OPC) to the target layout design. A lithography process check is performed on the electronic photomask to determine whether a patterned integrated circuit layer, which is to be manufactured based on the electronic photomask, is expected to be in conformance with the geometric pattern of the target layout design.