Singapore, Singapore

Duan Quan Liao

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 405(Granted Patents)


Company Filing History:


Years Active: 2013-2018

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: Inventor Duan Quan Liao - Leading Innovations in Semiconductor Technology

Introduction

Duan Quan Liao is an esteemed inventor based in Singapore, recognized for his significant contributions to the field of semiconductor technology. With a portfolio of 11 patents, Liao has demonstrated expertise in developing advanced methods and structures that enhance semiconductor device fabrication and functionality.

Latest Patents

Liao's latest innovations include two notable patents. The first patent, "Method for Fabricating Semiconductor Device," discloses a comprehensive approach to fabricating semiconductor devices. This method involves providing a substrate with a gate structure, removing parts of a hard mask, and forming a second hard mask layer, culminating in a refined fabrication process.

The second patent, "Semiconductor Structure and Process Thereof," outlines a detailed semiconductor structure that features a fin-shaped structure, a gate, source/drain regions, and an interdielectric layer. This innovative structure allows for improved contact and efficiency in semiconductor devices, reflecting Liao's commitment to advancing technology in this critical field.

Career Highlights

Duan Quan Liao is currently affiliated with United Microelectronics Corporation, a leading company in the semiconductor industry. His role enables him to leverage his vast knowledge and creativity to push the boundaries of semiconductor innovation. Liao's contributions have positioned him as a vital figure in the advancement of semiconductor technologies.

Collaborations

Throughout his career, Liao has collaborated with talented individuals, including notable coworkers Yikun Chen and Xiao Zhong Zhu. These collaborations have allowed for the exchange of ideas and facilitated the development of groundbreaking technologies in the semiconductor domain.

Conclusion

Duan Quan Liao continues to be a trailblazer in the semiconductor industry with his inventive patents and collaborative spirit. His work is instrumental in shaping the future of device fabrication and semiconductor structure, ensuring enhanced performance and capabilities for various applications. Liao’s journey serves as an inspiration for aspiring inventors and a testament to the power of innovation in technology.

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