Company Filing History:
21 out of 33 
5 out of 297 
2 out of 33 
Years Active: 2003-2022
Title: Innovator Spotlight: Diane Scott from Portland, OR
Introduction
Diane Scott is an accomplished inventor based in Portland, Oregon, recognized for her significant contributions to the field of chemical mechanical polishing. With an impressive portfolio of 29 patents, Diane has established herself as a leading figure in the innovation of polishing technologies.
Latest Patents
Among Diane's latest patents are innovative solutions designed to enhance the polishing process. The first patent covers “Coated Compressive Subpad for Chemical Mechanical Polishing,” which describes a polishing pad stack comprising a polishing pad with both a polishing surface and a back surface. Integral to this invention is a compressive subpad featuring a pressure-sensitive adhesive layer that is directly bonded to the back surface of the polishing pad. This design aims to optimize the efficiency and effectiveness of chemical mechanical polishing applications.
Another notable patent from Diane is the “Low Density Polishing Pad.” This invention presents a polishing pad for substrate polishing, characterized by a density range between 0.4-0.55 g/cc. The polishing body is composed of thermoset polyurethane and incorporates multiple closed-cell pores, each encased in an acrylic co-polymer shell. This innovation is geared toward improving the performance of polishing pads in various industrial applications.
Career Highlights
Diane's professional journey includes pivotal roles at renowned companies such as Nexplanar Corporation and Cabot Microelectronics Corporation. Throughout her career, she has been instrumental in driving advancements in polishing technologies that enhance manufacturing processes across industries.
Collaborations
Throughout her career, Diane has collaborated with esteemed colleagues including William C. Allison and Ping Huang. These partnerships have contributed to her innovative spirit, fostering an environment where ideas can flourish and new technologies can emerge.
Conclusion
Diane Scott's contributions to the field of chemical mechanical polishing have left an indelible mark on the industry. Her extensive patent portfolio and collaborations highlight her dedication to innovation and excellence. As Diane continues to push the boundaries of technology, her work undoubtedly inspires future generations of inventors and innovators.